Abstract

Abstract Light-emitting field-effect transistors (LEFET) based on poly[2-methoxy-5-(2-ethylhexoxy)-1,4-phenylenevinylene] (MEH-PPV) were prepared with asymmetric electrodes of a Au/Cr source and an Al drain on a SiO2 gate insulator (600 nm) through twice of photolithography and lift-off techniques. The light emission was observed when the gate voltages increased above −40 V at the drain voltage of −100 V. The luminous efficiency of the devices was significantly improved comparing to those with conventional electrodes of Au/Cr.

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