Abstract
Ni oxyhydroxide (NiOOH) thin films were prepared by reactive sputtering in an atmosphere of H2O gas, and effects of sputtering gas pressure on their electrochromic properties were studied. The largest optical density change was obtained for the thin films deposited under high sputtering pressures of around 50 mTorr because of their low film density and chemical composition close to NiOOH.
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