Abstract
Nano-graphite films have been deposited on n-Si substrates by microwaveplasma chemical vapour deposition. The surface morphology andmicrostructure of the films were tested by scanning electronmicroscopy, x-ray diffraction and Raman spectroscopy. In the fieldemission measurement, a turn-on field of 0.5 V/μm and a highemission-site density of 105/cm2 on a tested emission areaof (34×35 mm2) have been obtained.
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