Abstract

Mushroom composts were prepared under controlled temperature and aeration in bulk tunnels following a 4-day wetting and blending process. The temperature (51–68°C), O 2 concentration (<1–9% v/v) and duration (6–42 h) of an initial pasteurization phase were varied before all the substrates were given a standard aerated conditioning period at 47–49°C. An aerated (7–9% O 2 v/v) pasteurization regime of 58–61°C resulted in composts with the highest mushroom yield and, with the exception of ammonia, low levels of odour. No benefit was found from extending the pasteurization period beyond 6 h. A low O 2 concentration during pasteurization resulted in reduced moisture loss and increased compost bulk density which influenced the filling weight and mushroom yield per unit of cropping area. Substrate decomposition (based on ash content) and mushroom yield were reduced and strong odours were produced during the pasteurization. Increasing the compost nitrogen content from 1·6 to 3·1% of the compost dry matter (by increasing the quantity of deep litter poultry manure added to straw) resulted in a greater yield of mushrooms. Further increases in nitrogen content resulted in incomplete clearance of ammonia from the substrate and subsequently low or no mushroom yield. Recycling a proportion of processed substrate (18% of dry matter) in the compost ingredients reduced the processing time required to clear ammonia and increased compost bulk density with no significant effect on yield.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.