Abstract
A simple route for the preparation of nanoscopic metallic line patterns from functional block copolymers (BCPs) containing poly(2-vinylpyridine) or poly(methyl methacrylate) blocks is demonstrated. The time evolution of the surface morphologies of BCP thin films exposed to solvent vapors is studied to optimize the conditions for generating BCP microdomains oriented parallel or normal to the substrate. BCP templates are prepared by film reconstruction or by removal of one of the copolymer microdomains, depending on the properties of the functional BCPs. Finally, metallic line patterns are prepared by either electrochemical etching or direct metal deposition and lift-off processes using the BCP templates.
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