Abstract

The nanoscale indium tin oxide (ITO) particles are synthesied by liquid phase coprecipitation method under given conditions with solution of indium chloride, tin chloride, and ammonia. The absolute ethyl alcohol or deionized water was used as solvent and the dodecylamine or hexadecylamine surfactant was used as a dispersant in the reaction system. The sample powder was characterized by X‐ray diffraction (XRD), transmission electron microscopy (TEM), and high‐resolution electron microscopy (HRTEM). Based on the transmission electron micrograph, the influences of the two different solvents and the two different dispersants on the nanoparticle size and dispersion were studied, respectively. The results showed that the ITO particles are finely crystallized body‐centered cubic structure. The particle size has distributed in 30 nm to 90 nm.

Highlights

  • Tin-doped indium oxide (Indium tin oxide, indium tin oxide (ITO)), a kind of n-type semiconductor material, has a wide forbidden band(3.3 eV to 4.3 eV)

  • The morphology and structure of the prepared nanoparticles were characterized by means of a transmission electron microscopy (TEM) and X-ray diffraction (XRD)

  • The ITO particles that we prepared by co-precipitate method only have cubic structure

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Summary

Introduction

Tin-doped indium oxide (Indium tin oxide, ITO), a kind of n-type semiconductor material, has a wide forbidden band(3.3 eV to 4.3 eV). Indium tin oxide thin film has high transparency in the visible light region and lower electric resistivity [1, 2]. It has been used as electrodes in manufacturing of solar cells, flat panel displays, and gas sensors. Afterwards the target is sputtered to glass substrate by the controlled electron beam These techniques need costly equipments, and the utilization rate of the target materials is as low as 20% [3]. Dip-coating or spray deposition of light transparent, good conductive, and low-membrane resistant ITO film has been studied by the researchers [5–7]. The current methods for nanometer indium tin oxide preparation mainly include solid-phase method, liquid-phase method, and gas-phase method [8–10]

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