Abstract
Iodine containing diamond-like carbon (DLC) films were prepared by a plasma-enhanced chemical vapor deposition process using a mixture of trifluoroiodomethane (CF3I) and acetylene (C2H2) as plasma gas. The resulting films contain iodine throughout but are mostly fluorine free. Even though the precursor contains more fluorine than iodine, fluorine is only present in larger concentrations in the surface and interface region. The films are smooth, show a decreased hardness and a higher contact angle as compared to iodine free DLC films.
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