Abstract
Abstract. Mo-Nb, Mo-Ti, Mo-Ni-Ti sputtering target samples were prepared using Mo powder, Nb powder,Ni powder and Ti powder as raw materials by hot isostatic pressing (near net forming). The density, phase composition, microstructure and element distribution of Mo-Nb, Mo-Ti, Mo-Ni-Ti sputtered target samples were measured by optical microscope, scanning electron microscope and energy dispersive spectrometer. The experimental results show that hot isostatic pressing can prepare Mo-Nb target at lower temperature, and the obtained samples have finer grains, higher density and more uniform element distribution than that of non-pressure sintering. High-quality Mo-Nb, Mo-Ti, Mo-Ni-Ti sputtering targets (density>99%, grain size<100 μm) were obtained by hot isostatic pressing.
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