Abstract
The remanence of amorphous TbFe films with perpendicular anisotropy deposited by several deposition methods was investigated. The uniaxial anisotropy was enhanced in films deposited onto rotating substrates. The coercivity increased with dual gun sputtering compared to single gun sputtering. The remanence did not depend on the anisotropy directly but was mainly related to the wall coercivity. In dual gun rf magnetron sputter-deposited films onto rotating substrates, the wall coercivity was so large that magnetization rotation dominated the magnetization reversal, resulting in high remanence. The wall coercivity also increased in laminated films. A high remanence of 300 Gs with a residual ratio of 1 has been obtained in Tb31Fe69 films produced with a repetition of the deposition of a 0.5 µm thick lamina and the time intervals between the sputtering of each lamina.
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