Abstract
The effects of parameters such as chamber pressure, substrate temperature and methane concentration on the growth rate and the quality of diamond films deposited by DC arc plasma jet were studied. Free standing high quality transparent diamond thick films were produced at a growth rate up to 7–10 μm h −1 under the optimal conditions. Supersaturated atomic hydrogen played an important role in the process, which was produced due to the extremely high temperature of DC arc plasma jet.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
