Abstract
Film compositions were varied during formation of FeAlSi films by electron beam evaporation, and the magnetic properties measured. Films 4 to 5 μm thick were formed by evaporating a 4 wt% Al - 27.5 wt% Si - 68.5 wt% Fe tablet onto a photosensitive crystallized glass substrate heated to 400°C, varying the shutter opening/closing time to change the composition. Films were then heat-treated at 600°C. It was found that films with satisfactory properties can be obtained in the range Al = 3 - 5 wt%, Si = 9 - 12 wt%; films were such that B <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">s</sub> = 1.1 - 1.2 T, H <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">c</sub> ≤ 1.0 Oe,μ' > 2000, ρ = 70 μΩcm, and λ <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">s</sub> was zero or took on small positive values.
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