Abstract
Abstract Boron carbide was deposited onto CoCr/Cr/SiO 2 /Si substrate by RF magnetron sputtering. The films were prepared with substrate temperatures of less than 300°C at an applied power of 150 W. The reactive methane gas was introduced up to 1.6 vol % during deposition, and the resulting composition of the films matched these ratios, as observed by Auger electron spectroscopy. In X-ray photoelectron spectroscopy, two well-resolved peaks in C(1 s) spectra were observed around 284 eV, indicating C–C and B–C bonds. The surface hardness increased up to about 23 GPa and the scratched films endured the load of 40 N.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
