Abstract
The deposition of hydrogenated amorphous carbon films by an electron cyclotron resonance (ECR) microwave plasma and an ECR microwave ion beam source is described. Optical, electrical and mechanical measurements and different analytical methods are used for film characterization. The films deposited at a rate of about 200 nm min -1 develop a high electrical resistivity ( 10 9-10 14 Ω cm ), good IR transparency, an optical gap of about 1.7 eV and a hardness up to 30 GPa (measured on silicon substrates). Sputtering deposition experiments were performed with the aim of investigating the influence of the hydrogen on the layer properties as well as the possibilities of deposition on highly insulated substrates. Layers made by means of the sputtering deposition method indicated that hydrogen might be involved in the set-up of a metastable ion-assisted hydrogenated amorphous carbon.
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