Abstract
Aluminum oxide films were prepared by vapor deposition of aluminum and simultaneous irradiation with oxygen ion beam in the energy range of 2–24 keV with an Al/O transport ratio in the range of 0.5–14. The films were formed on Si(100) wafers and glass substrates fixed on a water-cooled holder. Film characterizations were carried out using X-ray photoelectron spectroscopy (XPS) for elemental composition measurements and chemical bonding states, and by X-ray diffraction (XRD) for film crystallization. The XPS spectra of Al 2p 1/2 obtained from samples with nearly stoichiometric composition (Al/O∼0.67) showed a peak at ∼74 eV corresponding to the AlO chemical bonding state of the γ phase. The XRD patterns of the films prepared with oxygen ion energy of 20–23 keV showed the crystallization of γ-Al 2O 3 on both Si(100) wafer and glass substrates. Mechanical and optical properties of the films were also presented in correlation with the deposition conditions.
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