Preparation of a novel ferrofluidic photoresist for two-photon photopolymerization technique

Abstract

We present a novel route for the preparation of ferrofluidic photoresist compatible with two-photon photopolymerization (TPP). To get a homogeneous ferrofluidic photoresit, the compatibility of photoresist and magnetic materials has been improved. Monodispersed Fe3O4 nanoparticles synthesized via thermal decomposition of iron precursor were stabilized by 6-(methacryloyloxy) hexanoic acid (a kind of acrylate-based monomer). A ferrofluidic photoresist was prepared by doping the modified Fe3O4 nanoparticles in acrylate-based resin. In this way, the dispersibility of nanoparticles in photoresist was enhanced significantly. As a representative example, a precise magnetic micron-sized spring was created. In the test of the magnetic response, the sensitivity of magnetic microspring was improved remarkably due to the optimization of the ferrofluidic photoresist. When the intensity of external magnetic field reached a value of 1500Gs, the deformation rate of the microspring would get to 2.25, indicating the compatibility of the ferrofluidic photoresist in microfabrication.