Abstract
Abstract Chemical mechanical polishing of sapphire with a novel catalyst (SoFeIII)-based colloidal silicon dioxide has been studied with high resolution transmission electron microscopy and X-ray diffraction. It has been found that a polytype of aluminun trihydroxide is formed on the polished crystal surface when SoFeIII-80 °C catalyst is used, while aluminum silicate hydrate layer is found on the polished sapphire surface when burnished with catalyst-free slurry. And the novel catalyst plays effective performance towards improving the removal rate of sapphire, and its removal rate is 7.21 μm/h, 1.66 times than the material removal rate obtained with catalyst-free slurry. Additionally, the optimum CMP removal by SoFeIII-80 °C yielded an ultra-smooth wafer surface with an average roughness of 0.0543 nm.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
