Abstract
Silicon oxide is widely used as a thin film to improve the surface properties of materials, because it is of anti-resistance, hardness, corrosion resistance, dielectric, optical transparency etc. Just as these excellent performances, silicon oxide thin films are used in many fields. There are many ways to get silicon oxide films, such as evaporating deposition, sputtering deposition, ion plating, plasma enhanced chemical vapor deposition (PECVD), atmospheric pressure plasma deposition, sol-gel method and oxidation method etc. and the preparative techniques have obtained a certain research results so far. In this article, the principle and research status of different preparation technologies were summarized, and the application of silicon oxide films were discussed in aspects of packaging industry, microelectronics field, andoptical field. Besides, its application prospect is forecasted. Silicon oxide film swith more stable performance will gradually become industrialization and occupy the dominant position in surface modification for a long time.
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