Abstract
The preparation and characterization of Au-doped iron oxide thin films is reported. Doped-thin films have been prepared by a liquid-phase deposition (LPD) method from aqueous solutions in the presence of a reactive atmosphere containing NH3. The morphology and microstructure of the prepared films are described. The effect of some process parameters (precursor solution concentration, calcination temperature) on the film formation, thickness and microstructure are investigated. Sensor devices based on Au/Fe2O3 thin films deposited on alumina by the LPD method, are sensitive to CO at operating temperatures between 200–400 °C.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Journal of Materials Science: Materials in Electronics
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
