Abstract
A silicon-containing benzoxazine (PDpsp-a) was synthesized from bis( p-hydroxyphenyl)diphenylsilane, aniline, and paraformaldehyde. The structure of the monomer was supported by 1H-NMR and FTIR spectra. The curing behavior of benzoxazine was evaluated by differential scanning calorimetry and in-situ FTIR spectra. The thermal properties were studied by MDSC, TGA, and Py-GC/MS. The results indicated that the characteristic peak of oxazine ring began to disappear when the temperature was heated to 180°C and completely disappeared at 260°C. The polybenzoxazine (PDpsp-a) possessed a high glass transition temperatures (174°C) and had good thermal stability (T10 = 420°C). In the pyrolysates of polybenzoxazine (PDpsp-a), no silicon-containing compounds, no phenol species, and more benzene were detected, we speculated that the Ar-Si bond would fracture with the increase of temperature. The benzene was volatilized from the system as a pyrolysis product and the silicon could react with oxygen to form siloxanes remained in the carbon residue in the form of siloxane compounds. The formed silica layer could endow the silicon-containing polybenzoxazine high thermal degradation stability and high char yield.
Published Version
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