Preparation and Performance Study of Chemical Mechanical Polishing Slurry for New-type Aluminium Alloy

Abstract

Aluminium alloys are widely used in various industries because of their lightness and easy processing, leading to higher requirements for aluminium alloys in terms of the flatness and finish of aluminium alloy surface. In this paper, chemical mechanical polishing (CMP) technology, which combines the advantages of chemical and mechanical polishing techniques, was studied to prepare one slurry suitable for new-type aluminium alloy and test its polishing performance. CeO2 powders were obtained as abrasive particles by a series of processes such as firing the mixture of NH4HCO3 and CeCl3 by precipitation method. The optimum ratio of the slurry included: 2.5% cerium oxide abrasive particles, NaOH as a pH adjuster at the optimal pH 10, and 3% sodium polyacrylate as the dispersant, so as to mix the CMP slurry with good dispersibility and stability. Then, the performance evaluation test of polishing was made by using the CMP slurry prepared under the optimal conditions on the aluminium alloy. The results showed that the polishing efficiency of the CMP slurry was higher, and the surface flatness, finish and roughness after polishing were in conformity with the requirements about aluminium alloy surface precision, with good polishing effect.