Preparation and Optical Patterning of Organic-Inorganic Hybrid Color-Filter Films Using Latent Pigments by Utilizing Photo-Acid-Generator and Microwave Irradiation

T Ohishi,S Sugawara

doi:10.4236/msa.2014.514111

Abstract

Preparation and photo-patterning characteristics of organic-inorganic hybrid thin film containing latent pigment by using photo-acid-generator (PAG) and microwave irradiation have been investigated. The acrylic thin film modified with methoxysilane containing PAG was formed on a glass substrate and irradiated with ultraviolet rays to promote sol-gel reaction by catalytic action of acid which was generated from PAG. And then the film was hardened with microwave irradiation, yielding organic-inorganic hybrid polymer film having hardness, highly transparency and strong adhesion with a glass substrate. Since this reaction only occurred in the optically (UV) irradiated regions, by exploiting the difference between the adhesivenesses of these regions photo-irradiated through photomask with a glass substrate, it was possible to form a patterned film with pitch of 100 to 50 μm by a simple lift-off method. A pigment-containing film using latent pigments (with subtractive three primary colors of coloring materials) and a patterned film were prepared, and it was possible to make these films multi-colored by varying the mixing ratio of the pigments. This multi-colored film-preparation method is effective for simply and efficiently forming a color-filter film by applying optical and microwave irradiation.

Highlights

In recent years, organic-inorganic hybrid films—which combine the flexibility and responsiveness of organic substances with the hardness of inorganic substances—are being applied in fields like integrated circuits and optical devices [1]-[10]
Color filters for display devices are an important field in which these organic-inorganic hybrid films are being applied
After a photo-acid generator (PAG) is added to the solvent for forming the PMPTMS film, a film is formed on a glass substrate

Summary

Introduction

Organic-inorganic hybrid films—which combine the flexibility and responsiveness of organic substances with the hardness of inorganic substances—are being applied in fields like integrated circuits and optical devices [1]-[10]. Color filters for display devices are an important field in which these organic-inorganic hybrid films are being applied. Present mainstream color filters consist of an organic pigment dispersed in a photosensitive organic polymer [16]. Degradation of their optical characteristics by the onset of agglomeration of the organic pigment in a solvent, low scratch resistance (derived from the organic polymer), and degradation of adhesion with the film’s substrate are some of the common problems with these filters. The process for manufacturing the color filter involves optical patterning by photolithography, which is beset by problems such as occurrence of liquid residue during post-light-exposure etching and shortening of film-hardening time [17] [18]. In light of the above-described problems, it is required to develop a new material for forming a color filter with higher performance and an easy-to-use optical-patterning method for manufacturing the filter

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Conclusion