Abstract
A one-step wet-etching method was developed to prepare the transparent conducting double-layered ZnO:Al films with textured surface for improving the light trapping ability.In this work, we investigated the effects of different deposition and re-deposition conditions including Ar flow rate, working pressure and substrate temperature on the light trapping properties of double-layered ZnO:Al films. Obvious changes for surface morphology of double-layerd films were observed, which displayed the significant influence of the re-deposition process. The double-layered ZnO:Al films presented low resistivity, high optical transmittance and haze value in the visible region, which can meet the requirements of front electrodes.
Sign-in/Register to access full text options 
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
