Preparation and Heck Reaction of Multidentate Carbosilane Films Derived from Focally Functionalized and Allyl-Terminated Dendrons on Hydrogen-Terminated Silicon(111) Surfaces

Abstract

Multidentate carbosilane films were prepared by thermally induced hydrosilylation of allyl-terminated carbosilane dendrons of generations 0, 1, and 2 (G0-G2) on hydrogen-terminated silicon(111) surfaces. The dendron molecules contain three (G0), nine (G1), and twenty-seven (G2) allyl groups at the periphery, and a bromophenyl functional group at the focal point. The dendron films were characterized by contact-angle goniometry, ellipsometry, Fourier transform infrared spectroscopy in the attenuated total reflection mode, and X-ray photoelectron spectroscopy (XPS). Upon hydroboration of the remaining allyl groups in the films, the percentage of the introduced boron atoms in the films were measured by XPS. The results indicate the presence of roughly 20%, 27%, and 46% of unreacted allyl groups in the G0, G1, and G2 films, respectively. The mechanistic aspects of the chemisorption of these dendron molecules on H-Si(111) surfaces are discussed. XPS studies indicate that seven G0 molecules cover approximately the same area on the substrate as three G1 molecules and one G2 molecule. After treatment of the G0, G1, and G2 films with 4-fluorostyrene under the Heck reaction conditions, the XPS studies indicate that about 84%, 71%, and 55% of the Br atoms were consumed, yielding the replacement of ca. 58-70% of the reacted Br atoms by the fluorostyryl groups. The remaining bromophenyl groups were inactive toward the Heck reaction, probably due to their disfavorable position/orientation in the films.