Abstract

Hard chromium nitride films were deposited by ion-beam-enhanced-deposition (IBED) technique. The effects of ion beam energy and ion beam current on microstructure and mechanical properties of IBED CrN films were studied, and the optimized parameters were found to prepare the films to improve the fretting wear resistance of Ti–6Al–4V. The fretting wear behavior of the IBED CrN film was evaluated using a ball-on-flat system under unlubricated conditions, and the results were compared with those of PVD CrN films. Results showed that both the bombardment energy and ion beam current had significant effects on the microstructure, preferred orientation, hardness and adhesion strength of the IBED CrN thin films. The Fretting wear resistance of IBED CrN films was better than those of PVD CrN films due to a dense and fine microstructure, good adhesion strength, deep hardening depth, etc. Fretting parameters (normal load and amplitude) played an important role in the transition of the fretting regime (from partial slip to gross slip regime). Oxidation and abrasive wear were the main fretting wear mechanisms for IBED CrN film.

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