Abstract
Crack-free Sm-doped Bi2Ti2O7 (Sm:BTO) thin films with strong (111) orientation have been prepared on Pt (111) substrates using a chemical solution deposition (CSD) method. The structural properties and crystallizations were studied by X-ray diffraction. The surface morphology and quality were examined using atomic force microscopy (AFM). The insulating and dielectric properties were also evaluated at room temperature. The results demonstrate that the Sm:BTO films exhibit improved electrical performances as compared to the pure Bi2Ti2O7 thin films and suggest a strong potential for utilization in microelectronics devices.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Published version (
Free)
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
