Abstract
Abstract Pure and antimony-incorporated TiO2 thin films were prepared using a spray-CVD method. The method allows for convenient incorporation of foreign atoms into the oxide matrix during film growth. The foreign atoms in the oxide film affects both the photovoltaic and photoelectrochemical properties of the n-Si/oxide heterojunction. The characteristics of the prepared oxide films were affected significantly by the presence of antimony on the oxide matrix. The increased conductivity of the Sb-containing oxide layers is reflected in the improved photovoltaic properties of the prepared n-Si/TiO2-Sb heterojunctions, e.g. fill factor and solar conversion efficiency. The photoelectrochemical properties of the prepared devices revealed that the charge transfer step at the oxide/electrolyte interface leads to a deterioration of the cell quality. However, this drawback has been offset by the improved properties of the heterojunction.
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