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Abstract
Thin films of giant magnetostrictive (Tb,Dy)Fe 2 alloys were prepared by three different deposition processes: ion beam sputtering, ion plating and flash evaporation. The flash evaporation process readily yields films with little deviation in composition from that of the source materials, while the ion-beam-sputtering process results in a composition deviation which depends on the substrate location. The ion-plating process yields a high rate of deposition but leads to a marked composition variation between source and film materials. The deposition conditions, mainly the background pressure, also have an important influence on the film characteristics.
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