Abstract
Thin films of solid electrolyte La0.9Sr0.1Ga0.8Mg0.2O3−δ (LSGM) were deposited by RF magnetron sputtering onto porous La0.7Sr0.3Cr0.5Mn0.5O3−δ (LSCM) anode substrates. The effects of substrate temperature, sputtering power density and sputtering Ar gas pressure on the LSGM thin film density, flatness and morphology were systematically investigated. RF sputtering power density of 7.8Wcm−2, substrate temperature of 300°C and sputtering Ar gas pressure of 5Pa are identified as the best technical parameters. In addition, a three-electrode half cell configuration was selected to investigate the electrochemical performance of the thin film. The LSGM film deposited at optimum conditions exhibited a lower area specific ohmic resistance of 0.68Ωcm−2 at 800°C, showing that the practicability of RF magnetron sputtering method to fabricate LSGM electrolyte thin film on porous LSCM anode substrates.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
