Abstract
Fluorocarbon films have been deposited by soft X-ray ablation of polytetrafluoroethylene (PTFE) and characterized as low-dielectric-constant interlayer dielectrics. Very rapid deposition of such films at about 1500 nm/min could be achieved at room temperature, and the dielectric constant of the deposited films is about 2.1. Fourier transform infrared spectroscopy (FT-IR) measurement results suggest that the deposited films are formed primarily as one-dimensional chains of (–CF2–)n which are cross-linked partially. The cross-link density increases with increasing deposition temperature, and their thermal stability improves. However, the dielectric constant of the films increased abruptly above 300°C.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.