Abstract
This work describes a methodology for producing high quality metallic surfaces from uranium primarily for characterisation and investigations involving electron backscatter diffraction. Electrochemical measurements have been conducted to inform ideal polishing conditions to produce surfaces free from strain, induced by mechanical polishing. A commonly used solution for the electropolishing of uranium, consisting in part of phosphoric acid, was used to conduct the electrochemical experiments and polishing. X-ray diffraction techniques focusing on the surface show low stresses and strains are exhibited within the material. This is mirrored in good quality electron backscatter diffraction.
Highlights
Strong scattering of x-rays and electrons in atomically heavy materials greatly inhibits penetration and results in sampling of the near-surface region [1]
This paper looks to elucidate the process of producing strain- and oxide-free surfaces in uranium metal through mechanical and electropolishing as characterised by x-ray diffraction (XRD) and electron backscatter diffraction (EBSD)
An appropriate polishing potential of at least 3 V has been found to be sufficient for this system
Summary
Strong scattering of x-rays and electrons in atomically heavy (highZ) materials greatly inhibits penetration and results in sampling of the near-surface region [1]. Excellent preparation of high-Z materials such as uranium is paramount for conventional, diffractionbased techniques. The susceptibility of the surface to mechanical deformation and chemical attack during preparation, leads to changes in chemistry and microstructural defects inhibiting coherent diffraction [2]. Sequential mechanical and electrochemical polishing of uranium and its alloys is standard practice [3,4]. Previous studies on uranium lack insight into the changes caused by this preparation method and how to perfect it. Chronoamperometry (potential step voltammetry) was used to assess diffusional characteristics and conduct polishing. Electrochemical testing was carried out inform appropriate polishing potentials and durations
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