Abstract
The saturation magnetostriction of sputtered Co/Cu/Co thin films affected by preferred crystal orientation distribution of NiFe underlayers has been investigated. The experimental results indicated that preferred crystal orientation of NiFe underlayers plays a significant role in affecting the magnetoelastic behavior of coupled Co films separated by a thin Cu film. Negative value of saturation magnetostriction (-4.9/spl times/10/sup -6/) was obtained on sample film deposited on the NiFe underlayer with a more random crystal orientation distribution, while positive value of saturation magnetostriction (+11.6/spl times/10/sup -6/) was found on sample film deposited on highly [111] oriented NiFe film. It is clear that the preferred crystal orientation distribution of NiFe underlayers has a marked effect on the saturation magnetostriction of Co/Cu/Co films that /spl lambda//sub s/ is very sensitive to film structure and crystalline orientation texture.
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