Abstract

From first principles, we predict several yet-unknown, low-energy, dynamically stable phases of hbox {HfO}_{2}. One of the predicted metastable phases has a finite ferroelectric polarization and could be potentially responsible for the ferroelectric and/or antiferroelectric behavior recently reported in thin hbox {(Hf,Zr)O}_{2}-based films. Other phases predicted here may potentially form as competing non-ferroelectric phases in thin films, and the possibility of their formation should be taken into account during analysis of experimental thin-film characterization data. These predictions are made possible by an explicit enumeration approach, designed for the case at hand. Our approach outperforms existing theoretical structure prediction methods, including evolutionary algorithms, which have been previously applied to the same problem yet have not identified most of the possible metastable phases found in this study. This suggests that structure enumeration techniques may be indispensable for practical structure prediction problems that seek to identify all low-energy metastable phases rather the single stable (lowest energy) phase.

Highlights

  • The interest in metastable hafnia (HfO2) and zirconia (ZrO2) phases has been intensified with the recent reports of ferroelectric and antiferroelectric responses in “doped” and some pure (Zr,Hf)O2 films [1,2]

  • Even the most conclusive phase determination to date [3], combining multiple characterization techniques, has had to rely on a pre-postulated set of possible structural candidates, which in turn has relied on a prior theoretical structure prediction study identifying possible metastable phases [15]

  • It is possible that a yet-unknown structural candidate could turn out to be a better match to all of the experimental data. The origin of the antiferroelectric behavior is even less clear

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Summary

Introduction

The interest in metastable hafnia (HfO2) and zirconia (ZrO2) phases has been intensified with the recent reports of ferroelectric and antiferroelectric responses in “doped” (alloyed) and some pure (Zr,Hf)O2 films [1,2].

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