Abstract
Photonic crystal reflector (PCR) membranes exhibit a resonantly enhanced normal-incidence reflectivity. Many applications require this resonance to occur at a specific wavelength, however, imposing geometrical tolerances that are not reliably achieved with standard nanolithography. Here we finely tune the resonant wavelength of a freestanding Si3N4 PCR membrane with iterative hydrofluoric acid etches, achieving a 57 nm thin crystal with a resonant wavelength 0.15 nm (0.04 linewidths) away from our target (1550 nm). This thin crystal exhibits a broader, shallower transmission dip than its simulated response to plane waves, and we identify two causes related to beam collimation. Finally, we present a series of simulations and general design considerations for realizing robust, high-reflectivity resonances.
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