Abstract
We have developed a precise imaging technique of atomic force microscopy (AFM) for steep and fine structures. The technique consists of a new scanning mode operation and a use of a probing tip with high aspect ratio. In this operation, topographic data of surface structures are obtained under a constant repulsive force at each measuring point, and after each measurement, the probing tip is withdrawn from the surface and moved to the next measuring point. We use a zinc oxide whisker as a probing tip with high aspect ratio. The complicated surface structures of IC devices with contact holes (1.5 μ m in depth) were accurately imaged in this AFM imaging technique.
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