Abstract
Z -lift electrostatic lithography on thin (10–50nm) polystyrene (PS) films is discussed. The height of nanostructures can be controlled via mechanically drawing or depressing the cantilever height (z-lift) during the application of a voltage. Since polymer is not removed or crosslinked during structure formation, the features are erasable. Various aspects such as voltage doses, film thickness, z-lift height, and rate are explored. Structure height formation relies mainly on, and is proportional, to the z-lift magnitude; however, only a narrow range of voltages yields structures for any given film thickness. Structures ranging from 0–10nm are produced on a 40nm thick PS film using −36V by varying the z-lift on a 0.1–0.9N∕m cantilever from −20nm to +400nm.
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