Abstract
The new analytical method, simultaneous multiple peak analysis (SIMPA) which comprises simultaneous fitting of whole measured thermally stimulated current (TSC) spectra is presented. The procedure clearly resolves contributions from various overlapping TSC peaks, which results in precise determination of trap parameters (signature) for each trap. In combination with photocurrent temperature dependent measurements, IPC(T), which reflects free carrier lifetime temperature dependence, the estimates of relative and absolute trap concentrations were made as well. The advantage of the SIMPA method in comparison with the single peak approach was demonstrated and analyzed. The SIMPA method was applied to different semi-insulating (SI) GaAs samples, particularly to samples having very high and others having very low deep trap concentrations; and for both extremes excellent fits were achieved. The method also seems very promising for characterization of deep levels and other similar SI materials, like SI InP or SI CdTe.
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