Precise chemical state analyses of ultrathin hafnium films deposited on clean Si(111)-7 × 7 surface using high-resolution core-level photoelectron spectroscopy

Abstract

Herein, well-defined ultrathin hafnium films on Si(111) -7 × 7 [Hf/Si(111)] were prepared by using electron beam heating in an ultrahigh vacuum (UHV) chamber at a pressure below 1.1 × 10−8 Pa. High-resolution core-level photoelectron spectroscopy of the Si 2p1/2, 3/2 and Hf 4f5/2, 7/2 levels combined with a synchrotron radiation X-ray light source was employed to reveal the chemical states at the interface and surface of ultrathin Hf/Si(111) films. Ultrathin Hf layers grow on clean Si(111)-7 × 7 surfaces by a lever rule that the first phase is not consumed when subsequent phases form. Therefore, it was found that the surface and interface of Hf/Si(111) certainly contains three components, which can be ascribed as metallic Hf layers, Hf monosilicide (HfSi), and Si-rich Hf silicide just above the Si substrate (HfSi4). The metallic Hf layers were observed to comprise some diffused Si atoms. According to the results obtained from photoelectron spectroscopy and scanning electron microscopy, ultrathin Hf layers change into HfSi2 islands on a bare Si(111)-7 × 7 surface after annealing at 1073 K. Small dot-shaped islands of HfSi2 appeared after annealing a two-monolayer thick Hf sample; whereas, rectangular HfSi2 islands including metallic Hf species randomly appeared after annealing a six-monolayer thick Hf sample. The long axes of the rectangle islands expanded in a direction that connected the corner holes in a model with dimers, adatoms, and stacking-faults (DAS model) of a clean Si(111)-7 × 7 surface. Our precise chemical analyses will be very useful for preparing well-defined interfaces and surface structures for obtaining next generation 3D metal-oxide-semiconductor field effect transistors and ferroelectric devices.