Abstract
The post-exposure-bake (PEB) deprotective reaction was investigated as a function of the exposure energy and bake time with FT-IR spectrum measurements of chemically amplified resist. It was found that the PEB deprotection model giving an acid loss rate that is proportional to its concentration cannot describe the suppression of deprotection for relatively low exposure energies. This paper proposes a PEB reaction model that gives an acid loss whose rate remains constant irrespective of the concentration, which can describe the suppression accurately. In addition, a constant acid loss enhances contrast of the resist development, which was observed experimentally over relatively long PEB times.
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