Abstract
Carbon films on the Si/SiO2 substrate are fabricated using modified method of close space sublimation at atmospheric pressure. The film properties have been characterized by micro-Raman and X-ray photoelectron spectroscopy and monochromatic ellipsometry methods. Ellipsometrical measurements demonstrated an increase of the silicon oxide film thickness in the course of manufacturing process. The XPS survey spectra of the as-prepared samples indicate that the main elements in the near-surface region are carbon, silicon, and oxygen. The narrow-scan spectra of C1s, Si2p, O1s regions indicate that silicon and oxygen are mainly in the SiO x (x ≈ 2) oxide form, whereas the main component of C1s spectrum at 284.4 eV comes from the sp2-hybridized carbon phase. Micro-Raman spectra confirmed the formation of graphene films with the number of layers that depended on the distance between the graphite source and substrate.
Highlights
IntroductionIntroduction to Carbon ScienceLondon: Butterworths; 1989. 24. Nan HY, Ni ZH, Wang J, Zafar Z, Shi ZX, Wang YY: The thermal stability of graphene in air investigated by Raman spectroscopy
Introduction to Carbon ScienceLondon: Butterworths; 1989. 24
Carbon films were deposited using the thermal sublimation of the graphite at atmospheric pressure in the quasi-closed volume created inside a muffle furnace
Summary
Introduction to Carbon ScienceLondon: Butterworths; 1989. 24. Nan HY, Ni ZH, Wang J, Zafar Z, Shi ZX, Wang YY: The thermal stability of graphene in air investigated by Raman spectroscopy. Graphene attracts enormous interest due to its unique properties, such as high charge carrier mobility and optical transparency, in addition to flexibility, high mechanical strength, environmental stability [1,2,3]. These properties have already had a huge impact on fundamental science and are making graphene and graphene-based materials very promising for the whole series of applications starting with electronics and ending with medicine [2,3]. In addition to deepening the understanding of the fundamental aspects of this material, the present stage of graphene research should target applications and manufacturing processes. Further development of the existing methods of graphene film production as well as invention of new ones is in order
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