Abstract

This work aims to study the effect of loading magnesia (0.5–2.0 wt%) on the positron annihilation parameters and electrical properties of the PVA-PVP blend. The films were synthesized by solution casting and checked by different techniques. XRD and HR-TEM of sol-gel prepared magnesia revealed that the average crystallite size was 14.29 nm with ribbon-like morphology with varying widths and lengths up to a few micrometers. SEM showed that the blend surface appeared smooth and homogenous and this confirmed the compatibility between PVA and PVP. However, loading magnesia increased surface roughness. TGA confirmed the thermal stability enhancement of blend film with magnesia incorporation. Ortho–positronium lifetime τ3 and the free volume Vf decrease with loading magnesia while the intensity I3 is nearly constant. These features were interpreted in view of the hole-filling mechanism, the interaction between magnesia & blend and magnesia morphology. The equilibrium swelling ratio ESR was found for the studied films and a positive correlation between ESR and Vf was reported. The current density-electric field, J-E, characteristics were of non-ohmic type. J increased with increasing magnesia levels and heating. The Richardson-Schottky effect was the dominant dc conduction mechanism at low temperature and low magnesia loading levels while it changed to Poole–Frenkel emission at higher values. Finally, a correlation between Log J and the intensity I2 was reported.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.