Positive working photoresists sensitive to visible light, II: poly{2‐arylpropyl‐2 and bis(p‐methoxyphenyl)methyl methacrylates}

Abstract

AbstractAcid‐labile polymers of methacrylates of 2‐(p‐substituted phenyl)propanol‐2 and bis(p‐methoxyphenyl)methanol were evaluated as visible light sensitive positive‐type resists. The chemistry to form images is based on the cleavage of esters catalysed by an acid generated by photodecomposition of diphenyliodonium hexafluorophosphate sensitized by 2‐benzoyl‐3‐(p‐dimethylaminophenyl)‐2‐propenenitrile. A copolymer of bis(p‐methoxyphenyl)methyl methacrylate‐phenyl methacrylate exhibited a high photospeed upon exposure to 488 nm light when coupled with the iodonium salt and the dye, and was applicable to relief holography.