Abstract

Ni/NiO multilayers with excellent sequencing are grown via radiofrequency magnetron sputtering with the use of one Ni target and natural oxidation. Ni layers consist of very small Ni nanocrystals interrupted by amorphous NiO layers. When Ni is deposited at 0.3 Pa Ar-pressure, the hard-magnetization axis is the film normal and saturation field decreases by decreasing Ni layer thickness. Considerable positive surface anisotropy is found, which is remarkable for Ni-based multilayers. If Ni is deposited at 3 Pa Ar-pressure, perpendicular magnetic anisotropy is observed at low temperatures even for 5.4 nm thick Ni layers. This anisotropy results in the formation of stripe magnetic domains.

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