Porous Silicon Micromachining to Position Optical Fibres in Silicon Integrated Optical Circuits

Abstract

Low-loss optical fibre connections require deep grooves etched in silicon substrate for accurate fibre positioning. As shown in this paper these grooves can be obtained by using localised formation of porous silicon on patterned substrates. Cr-Au masking layer with a duration in HF solution longer than 30 min is used to fabricate grooves with a depth higher than 75 μm. N+-type silicon provides grooves with a pseudo-V shape which is compatible with accurate fibre alignment. By using this technology, arrays of optical fibres are positioned with an accuracy higher than 1 μm.