Abstract
A technique to reduce the permeability decrease in a chemical vapor deposition pore modification of α-alumina support by a SiH4/C2H2/NH3 reaction system has been proposed. SiC−Si3N4 nanoparticles were formed in the gas phase of a hot-wall reactor at a temperature of 1323 K and deposited in/on the pore of the support to form a modification layer. The structure of the particles was confirmed by Fourier transform infrared and high-resolution transmission electron microscopy techniques to be a composite of crystalline SiC dispersed in an amorphous phase containing Si3N4. The structure retarded the sintering between the deposited particles and resulted in a modification layer with a large porosity on the surface of the membrane. A single gas permeation measurement showed that a reduction of the average pore diameter from 0.30 to 0.21 μm accompanied only an approximate 20% decrease in permeability: 31% reduction of the permeability decrease is achieved compared with the value predicted by a dense film depositi...
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