Polymers for Microelectronics

Abstract

Chemical Amplification Mechanisms for Microlithography Synthesis of 4-(tert-Butoxycarbonyl)-2,6-dinitrobenzyl Tosylate: A Potential Generator and Dissolution Inhibitor Solubilizable through Chemical Amplification Chemically Amplified Deep-UV Photoresists Based on Acetal-Protected Poly(vinylphenols) Novel Analytic Method of Photoinduced Acid Generation and Evidence of Photosensitization via Matrix Resin Acid-Catalyzed Dehydration: A New Mechanism for Chemically Amplified Lithographic Imaging An Alkaline-Developable Positive Resist Based on Silylated Polyhydroxystyrene for KrF Excimer Laser Lithography A Test for Correlation between Residual Solvent and Rates of N-Methylpyrrolidone Absorption by Polymer Films Dissolution Rates of Copolymers Based on 4-Hydroxystyrene and Styrene Synthesis and Polymerization of N-(tert-Butoxy)maleimide and Application of Its Polymers as a Chemical Amplification Resist Acid-Sensitive Pyrimidine Polymers for Chemical Amplification Resists Methacrylate Terpolymer Approach in the Design of a Family of Chemically Amplified Positive Resists Surface-Imaging Resists Using Photogenerated Acid-Catalyzed SiO[2 Formation by Chemical Vapor Deposition Polysilphenylenesiloxane Resist with Three-Dimensional Structure Top-Surface Imaging Using Selective Electroless Metallization of Patterned Monolayer Films Langmuir-Blodgett Deposition To Evaluate Dissolution Behavior of Multicomponent Resists Photochemical Control of a Morphology and Solubility Transformation in Poly(vinyl alcohol) Films Induced by Interfacial Contact with Siloxanes and Phenol-Formaldehyde Polymeric Photoresists Advances in the Chemistry of Resists for Ionizing Radiation Out-of-Plane Expansion Measurements in Polyimide Films Radiation-Induced Modifications of Allylamino-Substituted Polyphosphazenes Synthesis of Perfluorinated Polyimides for Optical Applications Charged Species in *s-Conjugated Polysilanes as Studied by Absorption Spectroscopy with Low-Temperature Matrices Acid-Sensitive Phenol-Formaldehyde Polymeric Resists Superiority of Bis(perfluorophenyl) Azides over Nonfluorinated Analogues as Cross-Linkers in Polystyrene-Based Deep-UV Resists New Photoresponsive Polymers Bearing Norbornadiene Moiety Synthesis by Selective Cationic Polymerization of 2-(3-Phenyl-2,5-norbornadiene-2-carbonyloxy)ethyl Vinyl Ether and Photochemical Reaction of the Resulting Polymers Photoinitiated Thermolysis of Poly(5-norbornene 2, 3-dicarboxylates): A Way to Polyconjugated Systems and Photoresists Recent Progress of the Application of Polyimides to Microelectronics Base-Catalyzed Cyclization of ortho-Aromatic Amide Aklyl Esters: A Novel Approach to Chemical Imidization Base-Catalyzed Photosensitive Polyimide Novel Cross-Linking Reagents Based on 3,3-Dimethyl-1-phenylenetriazene Preparation of Novel Photosensitive Polyimide Systems via Long-Lived Active Intermediates Photoregulation of Liquid-Crystalline Orientation by Anisotropic Photochromism of Surface Azobenzenes Factors Affecting the Stability of Polypyrrole Films at Higher Temperatures Intrinsic and Thermal Stress in Polyimide Thin Films Fluorinated, Soluble Polyimides with High-Glass-Transition Temperatures Based on a New, Rigid, Pentacyclic Dianhydride: 12,14-Diphenyl-12,14-bis(trifluoromethyl )-12H,14H-5,7-dioxapentacene-2,3,9,10-tetracarboxylic Dianhydride Processable Fluorinated Acrylic Resins with Low Dielectric Constants Enhanced Processing of Poly(tetrafluoroethylene) for Microelectronics Applications Fluorinated Poly(arylene ethers) with Low Dielectric Constants Microstructural Characterization of Thin Polyimide Films by Positron Lifetime Spectroscopy Synthesis and Characterization of New Poly(arylene ether oxadiazoles)