Abstract
Many antimony-carboxylate complexes containing polymerizable olefins are highly sensitive EUV photoresists. Herein we report two approaches by which we explored the reactivity of polymerizable olefin antimony carboxylate photoresists to improve lithographic performance. First, we explored the effect of replacing three phenyl groups with methyl groups in an effort to increase the relative concentration of olefins vs. size of the molecule. Second, we explored the effect of increasing the number of polymerizable olefins from two to five. This approach examines the use of tris(4-vinylphenyl)antimony-dicarboxylate complexes as photoresists and the developer chemistry capable of patterning highly crosslinked substrates.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
