Abstract
Contact photolithography was used to fabricate three-layer polymeric waveguide structures with transverse dimensions of 50 × 90 μm on the basis of two photopolymerizing methacrylate compositions with different refractive indices. The optical loss on the wavelength of 632.8 nm was 0.37 ± 0.14 dB cm−1. This loss is mostly due to the light scattering by the material of the waveguide layer produced by bulk polymerization.
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