Abstract
In this paper, polymer-stabilized cholesteric liquid crystal (PSCLC) films with broadband reflection are fabricated by photomask polymerization. Due to the small hole diffraction effect of light, a gradient of UV light intensity is formed in the upper part of the liquid crystal (LC) cell perpendicular to the thickness direction of the glass substrate, which induces the formation of the pitch gradient. The experimental conditions for the optimal reflection bandwidth were obtained by studying the concentration of polymerizable monomers, temperature, time, and UV light intensity of the mask polymerization. The results showed that the reflectance bandwidth was broadened from 293 nm to 508 nm. The method has the advantages of simple preparation process, effective broadening of reflection bandwidth and reusability, which provides new practical guidance for the preparation of PSCLC films with broadband reflectance.
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