Polymer photonic crystal band edge laser fabricated by nanoimprint lithography

Abstract

We fabricated polymer photonic crystal band edge lasers using nanoimprint lithography. The laser emission wavelength can be tuned by controlling the lattice constant of the PhCs, covering a wavelength range of 30 nm around 550 nm. Unlike the electron-beam lithography commonly used for patterning nanophotonic structures, NIL offers a cost-efficient, rapid and large area processing capability. The direct transfer of the PhC pattern in an active layer reduces the number of process steps for the fabrication of this type of lasers.