Abstract
We report on the fabrication and characterization of photonic band-gaps structures by nanoimprint lithography in a dye-doped polymer. Photonic band calculations show that photonic crystal slabs composed of a triangular array of polymer pillars could exhibit photonic band-gaps for the magnetic-like modes. The resulting structures show that the nanoimprint lithography process is well-suited to fabricate in a single-step process, these challenging photonic structures opening perspectives to realize integrated photonic band-gap circuits.
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